Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions
| Line 6: | Line 6: | ||
==The Set-Up== | ==The Set-Up== | ||
The chamber in RTP Annealsys possesses a top and bottom halogen lamp-configuration (16 infra-red lamps). As such, the samples are rapidly heated from both sides, simultaneously. In addition, the chamber is enclosed by two quartz-windows (immediately below/above the set of top/bottom lamps) and it is connected to two external vacuum pumps, to a gas inlet and the loadlock. Similarly, the loadlock is also connected to two external pumps. Moreover, the chamber and the loadlock are separated by the gate valve. While processing, the valve remains closed; it is only opened to exchange the substrates when both chamber and loadlock are under vacuum. The substrate transfer is possible due to the mechanical, retractable arm. | The chamber in RTP Annealsys possesses a top and bottom halogen lamp-configuration (16 infra-red lamps, in total). As such, the samples are rapidly heated from both sides, simultaneously. In addition, the chamber is enclosed by two quartz-windows (immediately below/above the set of top/bottom lamps) and it is connected to two external vacuum pumps, to a gas inlet and the loadlock. Similarly, the loadlock is also connected to two external pumps. Moreover, the chamber and the loadlock are separated by the gate valve. While processing, the valve remains closed; it is only opened to exchange the substrates when both chamber and loadlock are under vacuum. The substrate transfer is possible due to the mechanical, retractable arm. | ||
==Temperature Measurement and Control== | ==Temperature Measurement and Control== | ||