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Specific Process Knowledge/Lithography/EBeamLithography/EBLLandingpage: Difference between revisions

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!style="background:silver; color:black" align="left" valign="top" rowspan="2"|Performance
!style="background:silver; color:black" align="left" valign="top" rowspan="2"|Performance
|style="background:LightGrey; color:black"|Resolution
|style="background:LightGrey; color:black"|Resolution
|style="background:WhiteSmoke; color:black"|7-10 nm minimum feature size
|style="background:WhiteSmoke; color:black"|8 nm  
|style="background:WhiteSmoke; color:black"|35 nm minimum feature size
|style="background:WhiteSmoke; color:black"|35 nm
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