Specific Process Knowledge/Thermal Process/RTP Annealsys: Difference between revisions
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RTP Annealsys offers an optical pyrometry system for temperature measurement, not requiring any contact with the wafer. | RTP Annealsys offers an optical pyrometry system for temperature measurement, not requiring any contact with the wafer. | ||
Regarding | Regarding setting the process temperature, it is also important to mention the tool can function under two distinct modes – power and temperature/pyro control modes. In other words, using power control mode, the tool is programmed to fix the lamp’s power at a specific value (%) and consequently, the temperature inside the chamber varies with time; using the temperature/pyro control mode, the tool is programmed to vary the lamps’ power to maintain the temperature stable and constant inside the chamber at a previously established value in the recipe. | ||
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