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Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/ORE with Al2O3 mask: Difference between revisions

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NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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Mfarin (talk | contribs)
NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
781 edits
Line 125: Line 125:
|-
|-
! rowspan="3" align="center"| Isotropic etch
! rowspan="3" align="center"| Isotropic etch
| Col2_Row7
| O-step
| Col3_Row7
| 300
| 200 mTorr
| 200
| 0
| 0
| 2000
|-
|-
| Col2_Row8
| R-step
| Col3_Row8
| 30
| 100%
| 0
| 40
| 40
| 0
|-
|-
| Col2_Row9
| E-step
| Col3_Row9
| 20
| 200 mTorr
| 0
| 1200
| 0
| 2000
|-  
|-  
|}
|}
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