Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/ORE with Al2O3 mask: Difference between revisions
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Some isotropic etches were performed, intercalated with anisotropic etches. The nanoholes are 200nm wide, with 400nm pitch. | Some isotropic etches were performed, intercalated with anisotropic etches. The nanoholes are 200nm wide, with 400nm pitch. | ||
[[File:cpr + iso x2 meas.png|400px|left|thumb|'''''x2 anisotropic + isotropic etch.''''']] | [[File:cpr + iso x2 meas.png|400px|left|thumb|'''''x2 anisotropic + isotropic etch.''''']] | ||
{| border="2" cellpadding="2" cellspacing="1" | |||
|+ '''Table: nanoholes + isotropic etch''' | |||
|- | |||
! rowspan="1" align="center"| | |||
| | |||
| Time (s) | |||
| Pressure | |||
| O<sub>2</sub> flow (SCCM) | |||
| SF<sub>6</sub> flow (SCCM) | |||
| Power (W) | |||
|- | |||
! rowspan="4" align="center"| Nanoholes etch | |||
| O-step | |||
| Col3_Row1 | |||
|- | |||
| R-step | |||
| Col3_Row2 | |||
|- | |||
| E<sub>1</sub>-step | |||
| Col3_Row3 | |||
|- | |||
| E<sub>2</sub>-step | |||
| Col3_Row4 | |||
|- | |||
! rowspan="3" align="center"| Isotropic etch | |||
| Col2_Row7 | |||
| Col3_Row7 | |||
|- | |||
| Col2_Row8 | |||
| Col3_Row8 | |||
|- | |||
| Col2_Row9 | |||
| Col3_Row9 | |||
|- | |||
|} | |||
[[File:cpr + iso x3 meas.png|400px|left|thumb|'''''x3 anisotropic + isotropic etch.''''']] | [[File:cpr + iso x3 meas.png|400px|left|thumb|'''''x3 anisotropic + isotropic etch.''''']] | ||