Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/ORE with Al2O3 mask: Difference between revisions
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=== Isotropic etch === | === Isotropic etch === | ||
Some isotropic etches were performed, intercalated with anisotropic etches. The nanoholes are 200nm wide, with 400nm pitch. | |||
[[File:cpr + iso x2 meas.png|400px|left|thumb|'''''x2 anisotropic + isotropic etch.''''']] | |||
[[File:cpr + iso x3 meas.png|400px|left|thumb|'''''x3 anisotropic + isotropic etch.''''']] | |||
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