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Specific Process Knowledge/Etch/DRIE-Pegasus/Pegasus-2/ORE with Al2O3 mask: Difference between revisions

Mfarin (talk | contribs)
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![[File:17.6 holes.png|200px|left|thumb|'''''17.6 μm holes profile.''''']] !! Time (s) !! Pressure !! O<sub>2</sub> flow (SCCM) !! SF<sub>6</sub> flow (SCCM) !! Platen power (W) !! Coil power (W)
![[File:holes 17 e 10 um.png|200px|left|thumb|'''''17.6 μm holes profile.''''']] !! Time (s) !! Pressure !! O<sub>2</sub> flow (SCCM) !! SF<sub>6</sub> flow (SCCM) !! Platen power (W) !! Coil power (W)
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| '''O-step''' || 10 || 220 mTorr || 200 || 0 || 40 || 0
| '''O-step''' || 10 || 220 mTorr || 200 || 0 || 40 || 0
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| '''E<sub>2</sub>-step''' || 1-5 || 220 mTorr || 0 || 1200 || 1 || 2000
| '''E<sub>2</sub>-step''' || 1-5 || 220 mTorr || 0 || 1200 || 1 || 2000
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