Jump to content

Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions

← Older editNewer edit →
VisualWikitext
Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,915 edits
Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,915 edits
Line 132: Line 132:
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!AZ 5214E<br><span style="color:green">New Japanese version</span>
!AZ 5214E<br><span style="color:green">New Japanese version</span>
| 2021-03-23<br>jehem
| 2023-01-06<br>taran
| 1.5 µm
| 1.5 µm
| 405
| 405
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Aligners/Aligner:_Maskless_03_processing"