Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions
| Line 117: | Line 117: | ||
| 80 mJ/cm<sup>2</sup> | | 80 mJ/cm<sup>2</sup> | ||
| -2 | | -2 | ||
| 1. | | 1.75 µm | ||
| Dev: SP60s | | Dev: SP60s | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
| Line 125: | Line 125: | ||
|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
!AZ 5214E image reversal<br><span style="color:green">New Japanese version</span> | !AZ 5214E image reversal<br><span style="color:green">New Japanese version</span> | ||
| | | 2023-01-11<br>jehem | ||
| 2.2 µm | | 2.2 µm | ||
| Fast | | Fast | ||
| | | 42 mJ/cm<sup>2</sup> | ||
| - | | -2 | ||
| 1.75 µm | | 1.75 µm | ||
| Reversal bake: 60s@110°C, Flood exposure: 500mJ/cm<sup>2</sup>, Dev: SP60s | | Reversal bake: 60s@110°C, Flood exposure: 500mJ/cm<sup>2</sup>, Dev: SP60s | ||