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Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 01 processing: Difference between revisions

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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
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Jehem (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, danchip
1,871 edits
Line 112: Line 112:
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!AZ 5214E<br><span style="color:green">New Japanese version</span>
!AZ 5214E<br><span style="color:green">New Japanese version</span>
| 2021-08-19<br>jehem
| 2023-01-06<br>jehem
| 1.5 µm
| 1.5 µm
| Fast
| Fast
| 120 mJ/cm<sup>2</sup>
| 80 mJ/cm<sup>2</sup>
| -4
| -4
| 1.75 µm
| 1.5 µm
| Dev: SP60s
| Dev: SP60s
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
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