Specific Process Knowledge/Lithography/Aligners/Aligner: Maskless 03 processing: Difference between revisions
| Line 154: | Line 154: | ||
| 50 mJ/cm<sup>2</sup> | | 50 mJ/cm<sup>2</sup> | ||
| -2 | | -2 | ||
| 1 | | 1 µm | ||
| Reversal bake: 60s@110°C, Flood exposure: 500mJ/cm<sup>2</sup>, Dev: SP60s | | Reversal bake: 60s@110°C, Flood exposure: 500mJ/cm<sup>2</sup>, Dev: SP60s | ||
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