Specific Process Knowledge/Thin film deposition/Deposition of Tungsten: Difference between revisions
| Line 115: | Line 115: | ||
(for a 60 nm film it rose above 123 C) | (for a 60 nm film it rose above 123 C) | ||
Wait for low base pressure (3-5 10<sup>-7</sup> Torr) | Wait for low base pressure before start (3-5 10<sup>-7</sup> Torr) | ||
|Deposition rate is 0.107 nm/s for 150W and 3mTorr (Src3, DC) | |Deposition rate is 0.107 nm/s for 150W and 3mTorr (Src3, DC) | ||
|Deposition rate is 0.124 nm/s for 140W and 3mTorr (PC3, Src3 DC), | |Deposition rate is 0.124 nm/s for 140W and 3mTorr (PC3, Src3 DC), | ||