Specific Process Knowledge/Thin film deposition/Deposition of Tungsten: Difference between revisions
| Line 40: | Line 40: | ||
|10Å to 600nm | |10Å to 600nm | ||
|10Å to 600nm | |10Å to 600nm | ||
|10Å to | |10Å to 250nm | ||
|- | |- | ||
| Line 48: | Line 48: | ||
|about 1 Å/s | |about 1 Å/s | ||
|about 1 Å/s | |about 1 Å/s | ||
| | |configuration dependent | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
! Batch size | ! Batch size | ||
| Line 60: | Line 60: | ||
*small pieces | *small pieces | ||
| | | | ||
*Up to | *Up to 10x4" wafers | ||
*Up to | *Up to 10x6" wafer | ||
*small pieces | *small pieces | ||
| | | | ||
*Up to 1x4" wafers | *Up to 1x4" wafers | ||
*small pieces | *small pieces | ||
|- | |- | ||