Specific Process Knowledge/Thin film deposition/Deposition of Tungsten: Difference between revisions
| Line 117: | Line 117: | ||
Wait for low base pressure (3-5 10<sup>-7</sup> Torr) | Wait for low base pressure (3-5 10<sup>-7</sup> Torr) | ||
|Deposition rate is 0. | |Deposition rate is 0.107 nm/s for 150W and 3mTorr (Src3, DC) | ||
|Deposition rate is 0.083 nm/s for 150W and 3mTorr | |Deposition rate is 0.083 nm/s for 150W and 3mTorr | ||
|Deposition rate is 0.083 nm/s for 150W and 3mTorr | |Deposition rate is 0.083 nm/s for 150W and 3mTorr | ||