Revision as of 15:49, 15 December 2022

The DREM processes

**DREM 2kW micro**
Recipe	General							Pressure						Gases																Generators						Matching								Tem- pera- ture	Results
	General							Pressure						C₄F₈						SF₆						O₂		Ar		Coil		Platen				Coil				Platen					Results
	Platen		Stb	S/E	Dp	Et	Cyc	Dp			Et			Dp			Et			Dp			Et			Dp	Et	Dp	Et	Dp	Et	Dp	Et			Dp		Et		Dp		Et			Runs	Keywords
	U/D	H/L	Stb	S/E	Dp	Et	Cyc	D	B	M	D	B	M	D	B	M	D	B	M	D	B	M	D	B	M	Dp	Et	Dp	Et	Dp	Et	Dp	D	B	M	L	T	L	T	L	T	L	T		Runs	Keywords
DREM 2kW micro	Pump to base, Clamp Substrate, home platen matching unit, stabilisation																																												8
DREM 2kW micro	U	HF		D/E	1.2	3				100%			100%	0.3@5	0.5@50	200	0.5@100		5	0.3@200	0.5@200	15	2@15	0.3@100	200			150	150	2	2	1	1@1	1@100	1	40	50	40	50	32.5	51.9	32.5	51.9	0	8
DREM 2kW micro	Pump to base, Clamp Substrate, home platen matching unit, stabilisation																																												1
DREM 2kW micro	U	HF		D/E	1.2	3				100%			100%	0.3@5	0.5@50	200	0.5@100		5	0.3@200	0.5@200	15	2@15	0.3@100	200			150	150	2	2	1	1@1	1@100	1	40	50	40	50	32.5	51.9	32.5	51.9	-19	1

0 Home matching
	General	Time	Pressure	Gas	" >Power	Matching	Miscellaneous
Setting		90t	7T	sulf	yes, lots	lit	na

Front Image	-
	<--!Dry your sample -->
<--!Thermal treatment of your sample -->	Make a mask on your sample

Clean your sample
Entry page in LabAdviser	Techniques	Materials
Wafer cleaning	Soap Sonic	Removes dust and particles
	7-up & Piranha	Removes traces of organics and alkali ions
	RCA	Two step process to remove traces of organics and metals
	5% HF	Removes native oxide
	IMEC	Removing dust, traces of organics and alkali ions and slightly polish the surface. Make the surface hydrophillic

Thermal treatment of your sample
Entry page in LabAdviser	Techniques	Materials
Thermal Process	Annealing (>350C)	Si, PECVD layers, Al, BCB curing, Polymer
	Oxidation	Si wafers
	Doping with B/P	Si wafers
	Pyrolysis	Resists: AZ, SU8, PDMS
	Rapid Thermal Anneal (RTP)	SiO2, Si3N4, Ti, III-V
Lithography/Baking	Baking (<300dg)	baking resist and polymers

Make a mask on your sample
Entry page in LabAdviser	Techniques	Materials
Lithography	Pattern design & Mask fabrication
	Photolithography	UV resists
	Deep UV lithography	DUV resists
	E-beam lithography	E-beam resists
	Imprinting	Polymers

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 ! class="hideImage" width="150" height="180px"|
-! class="hideImage" width="150" | <--Dry your sample [[file:jehanDry.png|130px|frameless  ]] -->
+! class="hideImage" width="150" | <--!Dry your sample [[file:jehanDry.png|130px|frameless  ]] -->
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-! class="hideImage" width="150" height="180px"| <--Thermal treatment of your sample [[file:jehanThermal.png|130px|frameless ]]-->
+! class="hideImage" width="150" height="180px"| <--!Thermal treatment of your sample [[file:jehanThermal.png|130px|frameless ]]-->
 ! class="hideImage" width="150" | Make a mask on your sample[[file:jehanmask.png|130px|frameless ]]
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