Specific Process Knowledge/Etch/DRIE-Pegasus/DREM: Difference between revisions

From LabAdviser
Jmli (talk | contribs)
Jmli (talk | contribs)
Line 334: Line 334:
|[[Specific_Process_Knowledge/Etch/DryEtchProcessing/Bonding |Etch/DryEtchProcessing/Bonding]]
|[[Specific_Process_Knowledge/Etch/DryEtchProcessing/Bonding |Etch/DryEtchProcessing/Bonding]]
|Temporary bonding of wafers or chips for dry etching
|Temporary bonding of wafers or chips for dry etching
|-
|}
{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2"  align="left" width="430px"
!colspan="3" style="text-align:left;" | [[image:Characterize your sample.png|x100px|Characterize your sample]] Characterize your sample
|-
!Entry page in LabAdviser
!What do you need to measure?
!Technique/Method
|-
|rowspan="12" valign="top"|[[Specific Process Knowledge/Characterization|Characterization]]
|Sample Imaging, XY dimensions
|Microscopy: optical, SEM, AFM
|-
|Sample Topography
|AFM, Profiling with stylus or optical
|-
|Film thickness and optical constants
|Ellipsometry, Reflectometry, Prism Coupling
|-
|Film Stress
|Profiling with stylus or optical
|-
|Wafer thickness
|Micrometer gauge
|-
|Element analysis
|XPS, EDX, SIMS
|-
|Contact Angle
|Drop shape analyzing
|-
|Resistivity
|Four point probe, Probe station
|-
|Doping level/Carrier density
|ECV (Electrochemical Capacitance-Voltage) -profiler
|-
|Direct Bandgap
|Photoluminescence
|-
|Lattice mismatch
|X-ray diffractometer
|-
|Defects/contamination
|Particle/defect counter
|-
|}
{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2"  align="left" width="430px"
!colspan="3" style="text-align:left;" | [[image:Pack your sample (back-end).png|x100px|Pack your sample (back-end)]] Pack your sample (back-end)
|-
!Entry page in LabAdviser
!Techniques
|-
|rowspan="3" valign="top"|[[Specific Process Knowledge/Back-end processing|Back-end processing]]
|Chip/die mounting
|-
|Wire bonding
|-
|Dicing
|-
|}
{| class="wikitable hideable hidden" border="1" cellspacing="1" cellpadding="2"  align="left" width="430px"
!colspan="3" style="text-align:left;" | Process flow examples
|-
!Entry page in LabAdviser
!Topic
|-
|[[LabAdviser/Introduction_to_LabAdviser_and_Processing|Introduction to LabAdviser and Processing]]
|Solar cell flow
|-
|[[Process_flow_approval|Process flow approval]]
|Info on process flow review
|-
|[[Specific Process Knowledge/Lithography/UVLithography#Resist Overview|UV Lithography#Resist Overview]]
|UV Lithography flows
|-
|[[Specific Process Knowledge/Lithography/EBeamLithography#E-beam resists and Process Flows|EBeamLithography#E-beam resists and Process Flows]]
|E-beam lithography flows
|-
|-
|}
|}

Revision as of 15:21, 15 December 2022

The DREM processes

DREM 2kW micro

DREM 2kW micro
Recipe General Pressure Gases Generators Matching Tem- pera- ture Results
C4F8 SF6 O2 Ar Coil Platen Coil Platen
Platen Stb S/E Dp Et Cyc Dp Et Dp Et Dp Et Dp Et Dp Et Dp Et Dp Et Dp Et Dp Et Runs Keywords
U/D H/L D B M D B M D B M D B M D B M D B M D B M L T L T L T L T
DREM 2kW micro Pump to base, Clamp Substrate, home platen matching unit, stabilisation 8
U HF D/E 1.2 3 100% 100% 0.3@5 0.5@50 200 0.5@100 5 0.3@200 0.5@200 15 2@15 0.3@100 200 150 150 2 2 1 1@1 1@100 1 40 50 40 50 32.5 51.9 32.5 51.9 0
DREM 2kW micro Pump to base, Clamp Substrate, home platen matching unit, stabilisation 1
U HF D/E 1.2 3 100% 100% 0.3@5 0.5@50 200 0.5@100 5 0.3@200 0.5@200 15 2@15 0.3@100 200 150 150 2 2 1 1@1 1@100 1 40 50 40 50 32.5 51.9 32.5 51.9 -19
0 Home matching  
General Time Pressure Gas " >Power Matching Miscellaneous
Setting 90t 7T sulf yes, lots lit na


Overview of micro and nano fabrication steps - a guide to where you can find fabrication information in LabAdviser

- - -
Clean your sample Dry your sample Create a thin film on your sample Dope your sample
Thermal treatment of your sample Make a mask on your sample Transfer pattern to your sample Define your structure directly
Bond your samples together Characterize your sample Pack your sample Process flow examples