Specific Process Knowledge/Etch/DRIE-Pegasus/DREM

DREM 2kW micro

DREM 2kW micro

Recipe	General							Pressure						Gases																Generators						Matching								Tem- pera- ture	Results
														C4F8						SF6						O2		Ar		Coil		Platen				Coil				Platen
	Platen		Stb	S/E	Dp	Et	Cyc	Dp			Et			Dp			Et			Dp			Et			Dp	Et	Dp	Et	Dp	Et	Dp	Et			Dp		Et		Dp		Et			Runs	Keywords
	U/D	H/L						D	B	M	D	B	M	D	B	M	D	B	M	D	B	M	D	B	M								D	B	M	L	T	L	T	L	T	L	T
DREM 2kW micro	Pump to base, Clamp Substrate, home platen matching unit, stabilisation																																												8
	U	HF		D/E	1.2	3				100%			100%	0.3@5	0.5@50	200	0.5@100		5	0.3@200	0.5@200	15	2@15	0.3@100	200			150	150	2	2	1	1@1	1@100	1	40	50	40	50	32.5	51.9	32.5	51.9	0
DREM 2kW micro	Pump to base, Clamp Substrate, home platen matching unit, stabilisation																																												1
	U	HF		D/E	1.2	3				100%			100%	0.3@5	0.5@50	200	0.5@100		5	0.3@200	0.5@200	15	2@15	0.3@100	200			150	150	2	2	1	1@1	1@100	1	40	50	40	50	32.5	51.9	32.5	51.9	-19

0 Home matching
	General	Time	Pressure	Gas	" >Power	Matching	Miscellaneous
Setting		90t	7T	sulf	yes, lots	lit	na

Overview of micro and nano fabrication steps - a guide to where you can find fabrication information in LabAdviser

Front Image - - - Clean your sample Dry your sample Create a thin film on your sample Dope your sample Thermal treatment of your sample Make a mask on your sample Transfer pattern to your sample Define your structure directly Bond your samples together Characterize your sample Pack your sample Process flow examples		Clean your sample Entry page in LabAdviser Techniques Materials Wafer cleaning Soap Sonic Removes dust and particles 7-up & Piranha Removes traces of organics and alkali ions RCA Two step process to remove traces of organics and metals 5% HF Removes native oxide IMEC Removing dust, traces of organics and alkali ions and slightly polish the surface. Make the surface hydrophillic Dry your sample Entry page in LabAdviser Techniques Materials Wafer and sample drying Spin dryers Whole wafers Critial point dryer Sensitive wafers Ethanol fume drying Sensitive wafers N2 blow drying N2 pistols Create a layer/film on your sample Entry page in LabAdviser Techniques Materials Thermal Process/Oxidation Thermal oxidation Thermal SiO2 Thin film deposition Sputter deposition Metals: Al, Ti, Cr, Co, Ni, Cu, Mo, Pd, Ag, Sn, Ta, W, Pt, Au, Fe, Mg, Nb, Ru Semiconductors: Si, Ge, ZnO Oxides: SiO2, ITO, TiO2, Al2O3, MgO, Ta2O5 Cr2O3 Transparent Conducting Oxides: ITO, AZO Alloys: TiW, NiCr, AlTi, NiV, AlCu, CoFe, CuTi, FeMn, MnIr, NiCo, NiFe, YSZ Thermal evaporation Al, Ge, Ag E-beam evaporation Metals: Ti, Cr, Al, Ni, Pt, Au, Mo, Nb, Pd, Ag, Cu, W, Ta Semiconductors: Si, Ge Oxides: SiO2, TiO2 Alloys: NiCr, TiAl LPCVD Si3N4, SRN, SiO2, Si (poly and amorph) PECVD Si3N4, SiO2, PBSG MVD FDTS Electroplating Ni Epitaxial growth /MOCVD Al, As, Ga, In, P. doping: Si, Zn Lithography/Coaters Spin coating resists, polymers Spray coating resists, polymers Dope your sample Entry page in LabAdviser Techniques Materials Doping Ion implant e.g. P, B, As PECVD Deposition of SiO2 or Si3N4 doped with P,B and Ge LPCVD Deposition of PolySi doped with B or P Predeposition and drive-in Doping Silicon wafers with boron Predeposition and drive-in Doping Silicon wafers with phosphorus Thermal treatment of your sample Entry page in LabAdviser Techniques Materials Thermal Process Annealing (>350C) Si, PECVD layers, Al, BCB curing, Polymer Oxidation Si wafers Doping with B/P Si wafers Pyrolysis Resists: AZ, SU8, PDMS Rapid Thermal Anneal (RTP) SiO2, Si3N4, Ti, III-V Lithography/Baking Baking (<300dg) baking resist and polymers Make a mask on your sample Entry page in LabAdviser Techniques Materials Lithography Pattern design & Mask fabrication Photolithography UV resists Deep UV lithography DUV resists E-beam lithography E-beam resists Imprinting Polymers Transfer mask pattern to your sample Entry page in LabAdviser Techniques Materials Etch Wet etch Si, Glass, SiO2, Si3N4, Al, Cr, Ti, Au, Pt, InP, InGaAsP, GaAs/AlGaAs Dry etch Any material Lithography/Lift-off Lift-off Most materials Define your structure directly Entry page in LabAdviser Techniques Materials Direct Structure Definition Polymer Injection molding Topas, PP, PE, PS LASER micro machining Silicon, Metal, Graphene (on silicon), Glass (Pyrex, fused silica), TOPAS, PMMA Dicing saw Silicon, Glass (Pyrex, fused silica) Imprinting TOPAS, PMMA Hot Embosser Topas, PP, PE, PS, PC, PMMA, ... Lithography definition SU8, AZ resists Bond your samples together Entry page in LabAdviser Techniques Bonding Eutectic bonding Fusion bonding Anodic bonding Etch/DryEtchProcessing/Bonding Temporary bonding of wafers or chips for dry etching Characterize your sample Entry page in LabAdviser What do you need to measure? Technique/Method Characterization Sample Imaging, XY dimensions Microscopy: optical, SEM, AFM Sample Topography AFM, Profiling with stylus or optical Film thickness and optical constants Ellipsometry, Reflectometry, Prism Coupling Film Stress Profiling with stylus or optical Wafer thickness Micrometer gauge Element analysis XPS, EDX, SIMS Contact Angle Drop shape analyzing Resistivity Four point probe, Probe station Doping level/Carrier density ECV (Electrochemical Capacitance-Voltage) -profiler Direct Bandgap Photoluminescence Lattice mismatch X-ray diffractometer Defects/contamination Particle/defect counter Pack your sample (back-end) Entry page in LabAdviser Techniques Back-end processing Chip/die mounting Wire bonding Dicing Process flow examples Entry page in LabAdviser Topic Introduction to LabAdviser and Processing Solar cell flow Process flow approval Info on process flow review UV Lithography#Resist Overview UV Lithography flows EBeamLithography#E-beam resists and Process Flows E-beam lithography flows