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Tantalum can be deposited by e-beam evaporation and sputter deposition. In the chart below you can compare the different deposition equipment.
Tantalum can be deposited by e-beam evaporation and sputter deposition. In the chart below you can compare the different deposition equipment.


You can read more about Ta sputter deposition using Sputter-System(Lesker) [[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Tantalum/Sputtering of Ta|here]].  
==E-beam evaporation of Tantalum==
 
You can read more about Ta sputter deposition using Sputter-System(Lesker)  
 
*[[Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Tantalum/Sputtering of Ta|here]].  
 
== E-beam evaporation of Tantalum ==
 
Tantalum can be deposited by e-beam assisted evaporation in the Temescal tool.
 
 
*[[/Ta Ebeam evaporation in Temescal |E-beam evaporation of Ta in Temescal]]
 
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