Specific Process Knowledge/Etch/Etching of Silicon Oxide: Difference between revisions
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==Dry etch with Hard mask== | |||
''By Martin Lind Ommen - ''fall 2016'' '' <br> | |||
Testing selectivities for SiO<sub>2</sub> etching with hard masks on AOE and ICP metal with different recipes.All tests are done with 100% etching load<br> | |||
[[File:Dry etching by Martin Lind Ommen Fall 2016.png|600px]]<br> | |||
MLO_psi is the version of SiO2_psi on labadviser that is shown under low line with reduction.<br> | |||
The recipe ICP is on ICP metal call: A SiO2 etch with C4F8 with resist mask<br> | |||
I had problems with this recipe - it gave polymer on the surface, therefor I do not have more info on that.<br> | |||