Specific Process Knowledge/Etch/Overview of chemicals: Difference between revisions
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!style="background:silver; color:black" align="left" valign="top" rowspan="2"|KOH | !style="background:silver; color:black" align="left" valign="top" rowspan="2"|KOH | ||
|style="background:LightGrey; color:black"|28% | |style="background:LightGrey; color:black"|28% | ||
|style="background:WhiteSmoke; color:black"|C | |||
|style="background:WhiteSmoke; color:black"|C | |style="background:WhiteSmoke; color:black"|C | ||
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Revision as of 12:35, 10 October 2022
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Chemical | Concentration | application | Comment |
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KOH | 28% | C | C |
TextB2 | C | ||
Process parameter range | TextC1 |
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TextC2 |
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Substrates | TextD1 |
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TextD2 |
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TextD3 |
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