Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium: Difference between revisions
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=== Recipe try out on DUV pattern with 100 nm Cr and approx. 300 nm DUV resist=== | |||
''by bghe@nanolab 2022-09-29'' | |||
* A piece of approx 2cmx2cm was bonded to a Si/SiO2 wafer | |||
*1 min O2 barc etch was done | |||
*3min20s of CR_AS_13 | |||
==Chromium etch in ICP metal on a thick glass substrate== | ==Chromium etch in ICP metal on a thick glass substrate== | ||