Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium

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Chromium etch in ICP metal - small substrate using carrier

The Chromium etch was carried out on the following substrate stack: 2" Si wafer with Cr laying in a 6" Si wafer with a 4" recess. The area outside the recess was covered by AZ resist. The work was carried out be Erol Zekovic @Nanotech and BGHE@nanolab

Cr etch

Parameter	Cr etch
Cl2 (sccm)	65
O2 (sccm)	15
Pressure (mTorr)	15
Coil power (W)	300
Platen power (W)	15
Temperature (oC)	50
Spacers (mm)	100
Etch rate (nm/min)	~32 (Date: 2014-08-13)
Zep520A resist selectivity	NA
Comment	Was masked by capton tape

• Etching lines in 100nm Cr with the Cr etch for 3 min with 300 nm DUV resist BGHE@Nanolab Feb 2022
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Chromium etch of hardmask for silicon nitride etching by Anders Simonsen@nbi.ku

Added by bghe@Nanolab
Anders has done some work on optimizing the Cr etch for at 20-40 nm thick Cr that was to be used as masking for a silicon nitride etch. The Cr etch was carriered out on the ICP metal and the silicon nitride etch was done on the AOE. You can see his results in this summery that he has made:

• Cr etch development report summery by Anders Simonesen, summer of 2022
• Here are the raw test data and SEM images from Anders Simonsen

Preferer result:

The SEM images where done after both the Cr etch and the silicon nitride etch in the AOE using the recipe "?". The important thing was to see how well the Cr works for masking the nitride given vertical and smooth sidewalls in the nitride.

Recipe	Pressure [mTorr]	Coil power [W]	Platen power [W]	Total Flow Cl2+O2 [sccm]	O2%	Temp		Time [s]	CSAR etch rate [nm/min]	CSAR rate w bond		Etch rate [nm/min]	Selectivity		coil load	coil tune	plat load	plat tune	Comment
test13/laqs	10	300	15	30	23.33	20		28	100.71			42.86	0.43						This recipe was chosen over no. 12 because it did not need a large over etch of the Cr (no foot).

• After Cr etch 75s with recipe 13 and nitride etch in the AOE 20s
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Chromium etch in ICP metal on a thick glass substrate

The Chromium etch has ONLY been carried out on the following substrate stack: The Chromium is sputter deposited onto a 2" quartz wafer and patterned by e-beam with Zep520A resist. This 2" QZ wafer is bonded with crystal bond to a 65mmx65mm quartz plate with the thickness: 6.35mm. This QZ plate is bonded to a Si wafer.

Cr etch by bghe@nanolab

Parameter	Cr etch
Cl2 (sccm)	65
O2 (sccm)	15
Pressure (mTorr)	15
Coil power (W)	300
Platen power (W)	15
Temperature (oC)	50 (no back side cooling)
Spacers (mm)	100
Etch rate (nm/min)	~14
Zep520A resist selectivity	~0.9
Comment	.