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Specific Process Knowledge/Etch/ICP Metal Etcher/Chromium: Difference between revisions

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* [[/Cr etch data from AS |Here are the raw test data and SEM images from Anders Simonsen]]
* [[/Cr etch data from AS |Here are the raw test data and SEM images from Anders Simonsen]]


Preferer result:
'''Preferer result:'''


The SEM images where done after both the Cr etch and the silicon nitride etch in the AOE using the recipe "?". The important thing was to see how well the Cr works for masking the nitride given vertical and smooth sidewalls in the nitride.   
The SEM images where done after both the Cr etch and the silicon nitride etch in the AOE using the recipe "?". The important thing was to see how well the Cr works for masking the nitride given vertical and smooth sidewalls in the nitride.