Specific Process Knowledge/Thin film deposition/Deposition of Silicon Nitride: Difference between revisions
| Line 73: | Line 73: | ||
==Choose deposition technique== | ==Choose deposition technique== | ||
*[[/Deposition of Silicon Nitride using LPCVD|Deposition of Silicon Nitride using LPCVD]] | *[[/Deposition of Silicon Nitride using LPCVD|Deposition of Silicon Nitride using LPCVD]] | ||
*[[/Deposition of Silicon Nitride using PECVD|Deposition of Silicon Nitride using PECVD]] | *[[/Deposition of Silicon Nitride using PECVD|Deposition of Silicon Nitride using PECVD]] - ''or oxynitride'' | ||