Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions

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-= Introduction =
+= File preparation for exposure on JEOL 9500 =
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-An e-beam exposure requires a v30-file, which contains information on the pattern to write, a jobdeck file (jdf-file), and a schedule file (sdf-file). The sdf- and jdf-file contain information about size and position of substrate, dose, current, and shot step. The sdf-file, jdf-file and v30-file are compiled to a magazine-file (mgn) on the 9500 computer.
+For pattern exposure on the JEOL 9500 tool the pattern must be stored in JEOLs own proprietary JEOL52v3.0 format, also known as V30.  At DTU Nanolab we use Beamer to generate the V30 file from the original design file. We recommend using GDS as the original file format although Beamer can read multiple formats. In addition to the a pattern file exposure requires a Schedule file (SDF) and a Jobdeck file (JDF). These are text files where the user defines exposure conditions. Before pattern writing these three files (V30, SDF and JDF) are compiled into a final magazine file (MGN) which fully defines the exposure job.
-When a magazine-file is prepared, the actual shot time can be estimated by the e-beam computer (9500).
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