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| The BEAMER software is used to convert files from GDSII format to v30-format. The BEAMER software is manufactured by GenISys (www.genisys-gmbh.de) and the software is installed on the ebprep computer. | | The BEAMER software is used to convert files from GDSII format to v30-format. The BEAMER software is manufactured by GenISys (www.genisys-gmbh.de) and the software is installed on the ebprep computer. |
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| BEAMER is endowed with a software that corrects for proximity errors in the e-beam exposure. You can read more about this function in the BEAMER manual [[Specific_Process_Knowledge/Lithography/EBeamLithography/BEAMER|here]] and in the BEAMER presentation here [[media:BEAMERPresentation.pdf|BEAMERPresentation.pdf]].
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| The proximity error correction require a forward and a backward range parameter, alfa and beta, and a ratio of backscattered energy to the forward scattered energy, eta. As alfa depends on the electron acceleration voltage, which is constant at 100kV, alfa is in BEAMER fixed to 0.007. Help to find beta and eta can be found [http://nanolithography.gatech.edu/proximity.htm here].
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| Alternatively, a [http://en.wikipedia.org/wiki/Proximity_effect_%28electron_beam_lithography%29 point-spread function] can be used in BEAMER to calculate the optimised dose-variation.
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| The main functions of BEAMER are: | | The main functions of BEAMER are: |
