Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

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	Other resist have to be developed in the E-beam developer fumehood in E-4 in beakers. Please notice ~~the~~ are specific beaker sets for alkaline developers and for solvent based developers.		Other resist have to be developed in the E-beam developer fumehood in E-4 in beakers. Please notice there are specific beaker sets for alkaline developers and for solvent based developers.

	= Proximity Error Correction (PEC) =		= Proximity Error Correction (PEC) =