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Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 196: Line 196:
|Labspin 2/3
|Labspin 2/3
|PGMEA
|PGMEA
|MIF726
|
*AR 300-47:DI (4:1)
*MIF726:DI (8:5)
|H2O
|H2O
|
|
*AR 300-73
*AR 300-73
*Oxygen plasma
*O2 plasma
|
|


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