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Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 162: Line 162:
|Gamma E-beam & UV or Labspin 2/3
|Gamma E-beam & UV or Labspin 2/3
|Anisole
|Anisole
|*AR-600-546 *AR-600-548 *N50 *MIBK:IPA
|*AR-600-546  
*AR-600-548  
*N50  
*MIBK:IPA
|IPA
|IPA
|AR-600-71, 1165 Remover
|AR-600-71, 1165 Remover
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