Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
| Line 162: | Line 162: | ||
|Gamma E-beam & UV or Labspin 2/3 | |Gamma E-beam & UV or Labspin 2/3 | ||
|Anisole | |Anisole | ||
|AR-600-546 | |*AR-600-546 *AR-600-548 *N50 *MIBK:IPA | ||
|IPA | |IPA | ||
|AR-600-71, 1165 Remover | |AR-600-71, 1165 Remover | ||