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Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
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|Standard positive resist, very similar to ZEP520.
|Standard positive resist, very similar to ZEP520.
|[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-P6200_CSAR62english_Allresist_product-information.pdf AR-P 6200 info]  
|[https://www.allresist.com/wp-content/uploads/sites/2/2020/03/AR-P6200_CSAR62english_Allresist_product-information.pdf AR-P 6200 info]  
|See table <u>[[Specific_Process_Knowledge/Lithography/Coaters#Coaters:_Comparison_Table|here]] </u>
|Gamma E-beam & UV or Labspin 2&3
|Anisole
|Anisole
|AR-600-546, AR-600-548, N50, MIBK:IPA
|AR-600-546, AR-600-548, N50, MIBK:IPA
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