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| Other resist have to be developed in the E-beam developer fumehood in E-4 in beakers. Please notice the are specific beaker sets for alkaline developers and for solvent based developers. | | Other resist have to be developed in the E-beam developer fumehood in E-4 in beakers. Please notice the are specific beaker sets for alkaline developers and for solvent based developers. |
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| == Cold development ==
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| <span style="font-size: 90%; text-align: right;">[[Specific_Process_Knowledge/Lithography/EBeamLithography/JEOL_JBX-9500FSZ#top|Go to top of this page]]</span>
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| [[Image:Coolplate2.jpg|250px|right|]]
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| We do have the possibility of making cold development, to get more vertical and smoother sidewalls. We have a coolplate that can go down to -2°C, with a ramp of app. 3 °C/min.
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| Is it recommended to make a dose test, if one is to transfer from ordinary development to cold.
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| '''Procedure'''
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| # Pour developer suited for your resist into a small blue cap bottle, and label it, remember to mark it with lot number, date and your name.
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| # Leave this small bottle of developer in the fridge in Cx1 at least overnight to acclimatize.
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| # Take the coolplate located in D3 (see picture) and connect it in Fumehood 10 (E-beam) place it on the sink-lid to keep a good airflow.
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| # Hold left button on the front panel of the cool plate and set temperature with up/down arrows.
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| # The cool plate can go down to -2°C, and the fridge is +5°C hence use a beaker and pour cold developer into it and place on the coolplate, leave it to acclimatize for the desired temperature.
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| Development time in cold development, should be subject to testing, depending on structure size and density, but is comparable with "normal" development times.
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| When developing at low temperatures, condensation can occur
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| '''Remember to clean up after you are done'''
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| <br>
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| = Proximity Error Correction (PEC) = | | = Proximity Error Correction (PEC) = |
