Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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== | == User resist bottles in the cleanroom == | ||
[[File:bottle.jpg|150px|right]] | [[File:bottle.jpg|150px|right]] | ||
We recommend all groups or users to have their own bottle of e-beam resist inside the cleanroom. | We recommend all groups or users to have their own bottle of e-beam resist inside the cleanroom. Please follow the guidelines below. | ||
* Find a blue-capped glass bottle in the cupboard next to office 055 in 346 (outside the cleanroom). | * Find a blue-capped glass bottle in the cupboard next to office 055 in 346 (outside the cleanroom). | ||
* Bring the bottle inside gowning; clean it thoroughly '''on the outside''' with water or alcohol | * Bring the bottle inside gowning; clean it thoroughly '''on the outside''' with water or alcohol | ||
* Bring the bottle to a fumehood inside the cleanroom; clean the bottle and the lid thoroughly '''on the inside''' with the main solvent of your resist. | * Bring the bottle to a fumehood inside the cleanroom; clean the bottle and the lid thoroughly '''on the inside''' with the main solvent of your resist, i.e. for CSAR use anisole. If in doubt which solvent your e-beam resist contains, consult the MSDS of the resist found [http://kemibrug.dk/searchpage/ here]. | ||
* If you need to dilute the resist, find a measurement beaker and clean it thoroughly in same solvent as your own bottle. For CSAR, ZEP, mr EBL, and anisole-based PMMA, you can use the measurement beaker in the box inside the fumehood in E-4. | * If you need to dilute the resist, find a measurement beaker and clean it thoroughly in same solvent as your own bottle. For CSAR, ZEP, mr EBL, and anisole-based PMMA, you can use the measurement beaker in the box inside the fumehood in E-4. | ||
* Let the bottle dry in the fumehood. | * Let the bottle dry in the fumehood. | ||
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When spin coating e-beam resist, you should use a pipette to transfer resist from your bottle to the substrate. If you pour the resist directly from your bottle, you will leave resist in the thread that will soon dry out and leave particles in the resist. | When spin coating e-beam resist, you should use a pipette to transfer resist from your bottle to the substrate. If you pour the resist directly from your bottle, you will leave resist in the thread that will soon dry out and leave particles in the resist. The disposable pipettes need to be thoroughly cleaned with a N2 gun before use (app. 20 s). After some practice, you can obtain particle-free 4" wafers if bottle and pipette (and spin coater) are properly cleaned. | ||
The disposable pipettes need to be thoroughly cleaned with a N2 gun before use (app. 20 s). After some practice, you can obtain particle-free 4" wafers if bottle and pipette (and spin coater) are properly cleaned. | |||
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Keep your resist bottles in up-right position, do not tilt or shake them too much, this can spread particles from the sidewall into the resist. | Keep your resist bottles in up-right position, do not tilt or shake them too much, this can spread particles from the sidewall into the resist. | ||