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| Line 124: |
Line 124: |
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| |} | | |} |
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|
| = E-beam resists = | | = E-beam resists = |
| Line 334: |
Line 336: |
| |acetone/1165 | | |acetone/1165 |
| |Trilayer stack: [[media:Process_Flow_Trilayer_Ebeam_Resist.docx|Process_Flow_Trilayer_Ebeam_Resist.docx]] | | |Trilayer stack: [[media:Process_Flow_Trilayer_Ebeam_Resist.docx|Process_Flow_Trilayer_Ebeam_Resist.docx]] |
|
| |
| |-
| |
| |-style="background:LightGrey; color:black"
| |
| |'''AR-N 7500.18'''
| |
| |Negative
| |
| |[http://www.allresist.com AllResist]
| |
| |Both e-beam, DUV and UV-sensitive resist. Currently being tested, contact [mailto:thope@dtu.dk Thomas Pedersen] for information.
| |
| |[[media:ARN7500.pdf|ARN7500.pdf]]
| |
| |See table <u>[[Specific_Process_Knowledge/Lithography/Coaters#Coaters:_Comparison_Table|here]] </u>
| |
| |PGMEA
| |
| |MIF726
| |
| |H2O
| |
| |
| |
| |
| |
|
| |
|
| |
| |}
| |
|
| |
| Non-standard DTU Nanolab resists not purchased by DTU Nanolab:
| |
|
| |
| {|border="1" cellspacing="1" cellpadding="3" style="text-align:left;" width="95%"
| |
| |-
| |
|
| |
| |-
| |
| |-style="background:silver; color:black"
| |
| |'''Resist'''
| |
| |'''Polarity'''
| |
| |'''Manufacturer'''
| |
| |'''Comments'''
| |
| |'''Technical reports'''
| |
| |'''Spinner'''
| |
| |'''Thinner'''
| |
| |'''Developer'''
| |
| |'''Rinse'''
| |
| |'''Remover'''
| |
| |'''Process flows (in docx-format)'''
| |
|
| |
| |-
| |
|
| |
|
| |
|
| |
|
| |
|
| |
| |-
| |
| |-style="background:WhiteSmoke; color:black"
| |
| |'''[[Specific_Process_Knowledge/Lithography/PMMA|PMMA]]'''
| |
| |Positive
| |
| | [http://www.allresist.com AllResist]
| |
| |We have various types of PMMA in the cleanroom. Please contact [mailto:Lithography@nanolab.dtu.dk Lithography] for information.
| |
| |
| |
| |See table <u>[[Specific_Process_Knowledge/Lithography/Coaters#Coaters:_Comparison_Table|here]] </u>
| |
| |Anisole
| |
| |MIBK:IPA (1:3), IPA:H2O
| |
| |IPA
| |
| |acetone/1165/Pirahna
| |
| |
| |
|
| |
|
| |
| |-
| |
| |-style="background:LightGrey; color:black"
| |
| |'''ZEP7000'''
| |
| |Positive
| |
| |ZEON
| |
| |Not approved. Low dose to clear, can be used for trilayer (PEC-free) resist-stack. Please contact [mailto:Lithography@nanolab.dtu.dk Lithography] for information.
| |
| |[[media:ZEP7000.pdf|ZEP7000.pdf]]
| |
| |See table <u>[[Specific_Process_Knowledge/Lithography/Coaters#Coaters:_Comparison_Table|here]] </u>
| |
| |Anisole
| |
| |ZED-500/Hexyl Acetate,n-amyl acetate, oxylene.
| |
| |IPA
| |
| |acetone/1165
| |
| |Trilayer stack: [[media:Process_Flow_Trilayer_Ebeam_Resist.docx|Process_Flow_Trilayer_Ebeam_Resist.docx]]
| |
|
| |
| |-
| |
| |-style="background:LightGrey; color:black"
| |
| |'''AR-N 7500.18'''
| |
| |Negative
| |
| |[http://www.allresist.com AllResist]
| |
| |Both e-beam, DUV and UV-sensitive resist. Currently being tested, contact [mailto:thope@dtu.dk Thomas Pedersen] for information.
| |
| |[[media:ARN7500.pdf|ARN7500.pdf]]
| |
| |See table <u>[[Specific_Process_Knowledge/Lithography/Coaters#Coaters:_Comparison_Table|here]] </u>
| |
| |PGMEA
| |
| |MIF726
| |
| |H2O
| |
| |
| |
| |
| |
|
| |
|
| |} | | |} |
|
| |
|
| <br/> | | <br/> |
|
| |
| If the resist is not adhering properly to the substrate, the coating looks like full of pinholes and the edge is not covered, try to remove the resist, dip 30s. in BHF, rinse 5 mins and spin dry, the spin coat again.
| |
|
| |
| <br/>
| |
| <br/>
| |
| <br/>
| |
|
| |
|
| |
|
| == E-beam resists in the cleanroom == | | == E-beam resists in the cleanroom == |
