Specific Process Knowledge/Etch/Wet III-V Etches: Difference between revisions
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'''(1)''' Ti from Titest.prg on Physimeca. It seems there is no measurable etching during first 10 seconds.'''(2)''' Process '''SiO2ky2''' in PECVD2 (2014-July Luisa Ottaviamo @photonics ). '''(3)''' Process '''STANDARD''' in PECVD2 (2014-July Luisa Ottaviano @ photonics). '''(4)''' Process '''SINSTD''' in PECVD2 (2014-July Luisa Ottaviano @ photonics). '''(5)''' Appl. Phys. Lett. vol. 51, 2222 (1987). | '''(1)''' Ti from Titest.prg on Physimeca. It seems there is no measurable etching during first 10 seconds.<br> | ||
'''(2)''' Process '''SiO2ky2''' in PECVD2 (2014-July Luisa Ottaviamo @photonics ). <br> | |||
'''(3)''' Process '''STANDARD''' in PECVD2 (2014-July Luisa Ottaviano @ photonics).<br> | |||
'''(4)''' Process '''SINSTD''' in PECVD2 (2014-July Luisa Ottaviano @ photonics). <br> | |||
'''(5)''' Appl. Phys. Lett. vol. 51, 2222 (1987). | |||
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<br>'''Note:''' neither Physimeca or PECVD2 is available anymore. Use the Temescal and the PECVD3/PECVD4 instead. | |||
==Citric Acid etch== | ==Citric Acid etch== | ||