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Specific Process Knowledge/Thin film deposition/Deposition of Tantalum: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Paphol (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
912 edits
Line 42: Line 42:
|0.5Å/s to 10Å/s
|0.5Å/s to 10Å/s
|~0.3Å/s
|~0.3Å/s
|~0.3Å/s
|Not been tested
|-
|-
|-style="background:WhiteSmoke; color:black"  
|-style="background:WhiteSmoke; color:black"  
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