Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions
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[[Image:WF_imagescan.png|500x500px|right|thumb| | [[Image:WF_imagescan.png|500x500px|right|thumb|WF alignment by image scan.]] | ||
[[Image:WF_linescan.png|500x500px|right|thumb|WF alignment by line scan.]] | |||
Prior to exposure the | Prior to exposure the | ||