Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions
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Currently two holders are available, a 4" wafer holder and a 100 mm Universal Sample Holder (USH) for substrates up to about 75x75 mm. Chips can be clamped on either of the 8 chip clamps on the USH. The sample holders will rest on three ceramic balls on the stage, each ceramic ball fits into one of the kinematic mounts of the sample holder. The kinematic mounts are adjusted to keep the sample holder as level as possible. When handling the sample holders it is important not to touch the kinematic mounts. | Currently two holders are available, a 4" wafer holder and a 100 mm Universal Sample Holder (USH) for substrates up to about 75x75 mm. Chips can be clamped on either of the 8 chip clamps on the USH. The sample holders will rest on three ceramic balls on the stage, each ceramic ball fits into one of the kinematic mounts of the sample holder. The kinematic mounts are adjusted to keep the sample holder as level as possible. When handling the sample holders it is important not to touch the kinematic mounts. | ||
==Dose information== | ==Dose information== | ||
[[Image:eLINE-Areas.png|800x800px|right|thumb|Base doses for exposure must be defined in the Pattern Parameter Calculation window.]] | [[Image:eLINE-Areas.png|800x800px|right|thumb|Base doses for exposure must be defined in the Pattern Parameter Calculation window.]] | ||
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[[Image:DoseChip6.png|300x300px|right|thumb|Overview image of the dose test design provided on the tool.]] | [[Image:DoseChip6.png|300x300px|right|thumb|Overview image of the dose test design provided on the tool.]] | ||
===Table of dose to clear (area or curved elements) on Si substrate=== | ===Table of dose to clear (area or curved elements) on Si substrate=== | ||
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==Typical beam currents== | ==Typical beam currents== | ||