Jump to content

Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions

← Older editNewer edit →
VisualWikitext
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,179 edits
Line 55: Line 55:


{| border="2" cellspacing="1" cellpadding="1" align="center"  
{| border="2" cellspacing="1" cellpadding="1" align="center"  
! style="background:silver; color:black" colspan="4" | Dose [µC/cm2]
! style="background:silver; color:black" colspan="4" | Area dose [µC/cm2]
|- valign="top"
|- valign="top"
! style="background:silver; color:black" | Acc. voltage
! style="background:silver; color:black" | Acc. voltage
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/EBeamLithography/eLINE"