Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/PrD-4: Difference between revisions

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Jmli (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Revision as of 10:18, 9 August 2022



Process runs
Date Substrate Information Process Information SEM Images
Wafer info Mask Material/ Exposed area Tool / Operator Conditioning Recipe Wafer ID Comments
8/1-2015 4" Wafer with travkaXX mask AZ standard Si / XX % Pegasus/jmli s004781 nanolab/jml/showerhead/prD/PrD-4, 150 cyc or 8:00 mins S004782 New showerhead

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