Specific Process Knowledge/Etch/DRIE-Pegasus/showerheadchange/ProcessD/NewProcessD: Difference between revisions
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Revision as of 11:12, 9 August 2022
| Date | Substrate Information | Process Information | SEM Images | ||||||
|---|---|---|---|---|---|---|---|---|---|
| Wafer info | Mask | Material/ Exposed area | Tool / Operator | Conditioning | Recipe | Wafer ID | Comments | ||
| 15/12-2014 | 4" Wafer with AZ resist | Travka50 pattern | Si / 50 % | Pegasus/jmli | 20 minute TDESC clean | nanolab/jml/showerhead/prD/New Process D, 75 cycles or 5:00 minutes | S004743 | New showerhead |
|
