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Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions

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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
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Sample holders and sample information
For EBL the system is a variable voltage exposure tool with a maximum acceleration voltage of 30 kV and beam currents from 0.01 to 12 nA.


[[File:RaithHolders.png|800px|thumb|left|4 inch wafer holder and 100 mm Universal Sample Holder (USH)]]
 
[[File:RaithHolders.png|800px|thumb|right|4 inch wafer holder and 100 mm Universal Sample Holder (USH)]]


Voltage - PEC
Voltage - PEC
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