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Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions

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Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
Thope (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab347-labadviser-users-35231
2,178 edits
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| style="background:WhiteSmoke; color:black"| 1.96
| style="background:WhiteSmoke; color:black"| 1.96
| style="background:WhiteSmoke; color:black"| 7.67
| style="background:WhiteSmoke; color:black"| 7.67
|- valign="top"
! style="background:lightgrey; color:black" | 20 kV
| style="background:lightgrey; color:black" |
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|- valign="top"
! style="background:Whitesmoke; color:black" | 20 kV HC
| style="background:WhiteSmoke; color:black"|
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|- valign="top"
! style="background:lightgrey; color:black" | 30 kV
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| style="background:lightgrey; color:black" |
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|- valign="top"
! style="background:Whitesmoke; color:black" | 30 kV HC
| style="background:WhiteSmoke; color:black"|
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