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===Table of dose to clear (area or curved elements) on Si substrate===
===Table of dose to clear (area or curved elements) on Si substrate===
The following table is merely at guideline to as to what sort of dose requirements to expect. Actual dose for your design will depend on substrate type and material, resist thickness, acceleration voltage pattern density and several other effects. Be aware that AR-N 8200 is in particular very dependent on PEB processing parameters. Refer to [[Specific_Process_Knowledge/Lithography/ARN8200|AR-N 8200]] page for more information.


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Beware that AR-N 8200 exposure result is extremely dependent on PEB process. Refer to [[Specific_Process_Knowledge/Lithography/ARN8200|AR-N 8200]] page for more information.


==Typical beam currents==
==Typical beam currents==
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