Specific Process Knowledge/Lithography/ARN8200: Difference between revisions

Revision as of 10:30, 8 August 2022

AR-N 8200

AR-N 8200 is a negative E-beam resist from Allresist, it is also known as "Medusa 82". A product presentation from Allresist is available here AR-N8200 presentation.

Allresist also provides these processing guidelines.

Contrast curve @ 100 kV (JEOL 9500)

Exposure dose for AR-N 8200 is very dependent on Post Exposure Bake (PEB) temperature. A contrast curve for four different PEB processes were obtained with the following process parameters.

AR-N 8200 Contrast Curve, Processed by THOPE, FEB 2022
Resist	Spin Coat	E-beam exposure	PEB	Development
AR-N8200.06	LabSpin 2, 4000 rpm for 60s, softbake 10 min @ 150 degC, thickness is 110 nm	JBX9500, 60 nA, doses 100-1600 µC/cm2, 150 µm x 300 µm rectangles	Labspin 2 hotplate, 130, 150, 160 or 170 degC for 10 min	EBL development fumehood, 60 sec development in AR300-47:DIW (1:1), 30 sec rinse in DIW, nitrogen gun dry

Hotplate temperatures are assumed surface temperatures based on the 0.90 correction factor in use on the hotplate.

The resulting resist structure height is mapped with Dektak XTa and plotted as a contrast curve below. It is apparent that the dose and contrast is very dependent on the PEB parameters.

Results at 30 kV (Raith eLINE)

A dose test is carried out with the following parameters

AR-N 8200 30 kV dose test, Processed by THOPE, AUG 2022
Resist	Spin Coat	E-beam exposure	PEB	Development
AR-N8200.06	LabSpin 2, 4000 rpm for 60s, softbake 10 min @ 150 degC, thickness is 120 nm	Raith eLINE Plus, 30 kV, 60 µm aperture, 168 pA	Labspin 2 hotplate 170 degC for 10 min	EBL development fumehood, 60 sec development in AR300-47:DIW (1:1), 30 sec rinse in DIW, nitrogen gun dry

@@ Line 46: / Line 46: @@
 [[file:ARN8200DoseCurve.png]]
+== Results at 30 kV (Raith eLINE) ==
+A dose test is carried out with the following parameters
+{|border="1" cellspacing="0" cellpadding="3" style="text-align:left;"  style="width: 95%"
+|-
+|-
+|-style="background:Black; color:White"
+!colspan="5"|AR-N 8200 30 kV dose test, Processed by THOPE, AUG 2022
+|-
+|-
+|-style="background:WhiteSmoke; color:black"
+!Resist
+!Spin Coat
+!E-beam exposure
+!PEB
+!Development
+|-
+|-
+|-style="background:WhiteSmoke; color:black"
+|AR-N8200.06
+|LabSpin 2, 4000 rpm for 60s, softbake 10 min @ 150 degC, thickness is 120 nm
+|Raith eLINE Plus, 30 kV, 60 µm aperture, 168 pA
+|Labspin 2 hotplate 170 degC for 10 min
+|EBL development fumehood, 60 sec development in AR300-47:DIW (1:1), 30 sec rinse in DIW, nitrogen gun dry
+|-
+|}