Specific Process Knowledge/Lithography/EBeamLithography/eLINE: Difference between revisions
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Beware that AR-N 8200 exposure result is extremely dependent on PEB process. Refer to AR-N 8200 page for more information. | Beware that AR-N 8200 exposure result is extremely dependent on PEB process. Refer to [[Specific_Process_Knowledge/Lithography/ARN8200|AR-N 8200]] page for more information. | ||
==Typical beam currents== | ==Typical beam currents== | ||