Specific Process Knowledge/Etch/Aluminum Oxide/Al2O3 Etch with ICP Metal: Difference between revisions
No edit summary |
|||
| Line 50: | Line 50: | ||
==Al2O3 etching by bghe@nanolab== | ==Al2O3 etching by bghe@nanolab== | ||
===Recipes=== | |||
{| border="2" cellpadding="2" cellspacing="1" style="text-align:center;" | |||
|+ '''Al2O3 etch''' | |||
|- | |||
! Parameter | |||
! width="200" | Recipe 1:Al2O3 etch platen only | |||
|- | |||
! BCl<sub>3</sub> (sccm) | |||
| 15 | |||
|- | |||
! Ar (sccm) | |||
| 15 | |||
|- | |||
! Pressure (mTorr) | |||
| 5 | |||
|- | |||
! Coil power (W) | |||
| 0 | |||
|- | |||
! Platen power (W) | |||
| 30 | |||
|- | |||
! Temperature (<sup>o</sup>C) | |||
| 20 | |||
|- | |||
! Spacers (mm) | |||
| 100 mm | |||
|- | |||
|} | |||
===Results=== | |||
Revision as of 13:46, 4 August 2022
Feedback to this page: click here
Al2O3 etching with the ICP metal
| Parameter | Recipe name: no name (testing recipe) |
|---|---|
| Coil Power [W] | 1200 |
| Platen Power [W] | 200 |
| Platen temperature [oC] | 0 |
| BCl3 flow [sccm] | 60 |
| Cl2 flow [sccm] | 30 |
| Pressure [mTorr] | 4 |
| Material to be etched | Etch rate using the above parameters |
|---|---|
| Al2O3 |
|
Al2O3 etching by sanvis@nanolab
Al2O3 etching by bghe@nanolab
Recipes
| Parameter | Recipe 1:Al2O3 etch platen only |
|---|---|
| BCl3 (sccm) | 15 |
| Ar (sccm) | 15 |
| Pressure (mTorr) | 5 |
| Coil power (W) | 0 |
| Platen power (W) | 30 |
| Temperature (oC) | 20 |
| Spacers (mm) | 100 mm |