Specific Process Knowledge/Lithography/Baking: Difference between revisions
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![[Specific_Process_Knowledge/Lithography/Baking#Hotplate:_90-110C|Hotplate: 90-110C]] | ![[Specific_Process_Knowledge/Lithography/Baking#Hotplate:_90-110C|Hotplate: 90-110C]] | ||
![[Specific_Process_Knowledge/Lithography/Baking#Hotplate_1_.28SU8.29.2C_Hotplate_2_.28SU8.29.2C_Hoplate_3.28SU8.29_and_Hotplate_4.28SU8.29|Hotplate 1, 2 | ![[Specific_Process_Knowledge/Lithography/Baking#Hotplate_1_.28SU8.29.2C_Hotplate_2_.28SU8.29.2C_Hoplate_3.28SU8.29_and_Hotplate_4.28SU8.29|Hotplate 1, 2 and 3 (SU8)]] | ||
![[Specific Process Knowledge/Lithography/Baking#Small_benchtop_hotplates|Small benchtop hotplates]] | ![[Specific Process Knowledge/Lithography/Baking#Small_benchtop_hotplates|Small benchtop hotplates]] | ||
![[Specific Process Knowledge/Lithography/Baking#Gamma_hotplates|Gamma hotplates]] | ![[Specific Process Knowledge/Lithography/Baking#Gamma_hotplates|Gamma hotplates]] | ||
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Hotplate 3:<br /> https://labmanager.dtu.dk/view_binary.php?type=data&mach=453 | Hotplate 3:<br /> https://labmanager.dtu.dk/view_binary.php?type=data&mach=453 | ||
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