Specific Process Knowledge/Thin film deposition/Si sputter in Wordentec: Difference between revisions

← Older edit Newer edit →

VisualWikitext

Revision as of 18:45, 27 July 2022 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,346 edits →Silicon sputtering in the Wordentec ← Older edit		Revision as of 18:46, 27 July 2022 view source Eves (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 4,346 edits →Silicon sputtering in the Wordentec Newer edit →
Line 3:		Line 3:
	= Silicon sputtering in the Wordentec=		= Silicon sputtering in the Wordentec=

	Silicon can be sputter deposited in the [[Specific Process Knowledge/Thin film deposition/Wordentec\|Wordentec]] as well as in the [[Specific Process Knowledge/Thin film deposition/Lesker\|Sputter-System(Lesker)]] (details on sputtering Si in the Sputter-System Lesker [[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si sputter in Sputter-System Lesker\|here]]) and in the new [[Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system\|Cluster Lesker]] (results [[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si sputter in Sputter-System Metal-Oxide(PC1)\|here]] and [[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si sputter in Sputter-System Metal-Oxide(PC3)\|here]])).		Silicon can be sputter deposited in the [[Specific Process Knowledge/Thin film deposition/Wordentec\|Wordentec]] as well as in the [[Specific Process Knowledge/Thin film deposition/Lesker\|Sputter-System(Lesker)]] (details on sputtering Si in the Sputter-System Lesker [[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si sputter in Sputter-System Lesker\|here]]) and in the new [[Specific Process Knowledge/Thin film deposition/Cluster-based multi-chamber high vacuum sputtering deposition system\|Cluster Lesker]] (results [[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si sputter in Sputter-System Metal-Oxide(PC1)\|here]] and [[Specific Process Knowledge/Thin film deposition/Deposition of Silicon/Si sputter in Sputter-System Metal-Oxide(PC3)\|here]]).