Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using Lesker sputter tool: Difference between revisions
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* <b><span style="color: green">2</span></b>. Do not increase oxygen levels above 10% for the same reason as above. | * <b><span style="color: green">2</span></b>. Do not increase oxygen levels above 10% for the same reason as above. | ||
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==Non reactive SiO<sub>2</sub> deposition from SiO<sub>2</sub> target== | ==Non reactive SiO<sub>2</sub> deposition from SiO<sub>2</sub> target== | ||